Physical Vapour Decomposition Method

PVD (Physical Vapour Decomposition) method is based on separating atoms from surfaces and accumulating (atomic or ionic) them to submaterial surface to be coated, by evaporating or sloping materials under vacuum. Coating material, in PVD method, is transmitted to surface in atomic, molecular or ionic form, obtaining it not chemically but physically from solid, liquid and gas source. Chemical reactions can exist on main material surface too colder than CVD coating (50500 °C); however such a reaction formation is no necessary. It is more interesting that PVD operation is performed in relatively lower temperatures. In addition, after completion of coating micro structure and properties of main material are not affected. PVD Method is carried out by three methods called as evaporating, dispersion and ionic coating.In the presented study, it was given the knowledge about the Physical Vapour Decomposition method and the developments in its applications.